Research on the influence of stamping materials on resist flow and the residual layer in thermal nanoimprint lithography

Abstract Various stamp materials can significantly affect the filling quality of nanoimprint lithography (NIL). The effects different on imprinting process were investigated from angles residual layer (RL) thickness, contact pressure, and proportion. selection various affects thickness uniformity RL. Soft stamps (PDMS, PU) leave a thin but uneven RL distribution, while imprinted by hard (Si, Ni) is thicker more uniform. pressure using soft relatively evenly distributed than stamps. distribution leads to poor cavity‐filling proportion, especially for This study offers guidance choosing proper NIL applications.